Aluminum Scandium Sputtering Target
Catalog Number
ACM113413857-3
Application
high purity Aluminum Scandium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.9% 99.5% 99.95% 99%99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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