Bismuth Lutetium Iron Gallate Sputtering Target
Catalog Number
ACMA00020748
Molecular Formula
Bi1.5Lu1.5Fe4GaO12
Application
high purity Bismuth Lutetium Iron Gallate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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