Cerium Zirconium Nickel Oxide Sputtering Target

Catalog Number

ACMA00020691

Molecular Formula

CeZr0.5NiOy

Appearance

Target

Application

high purity Cerium Zirconium Nickel Oxide Sputtering Targets with the highest possible density High Purity (99.99%) Cerium Zirconium Nickel Oxide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Specification

99.999% 99.99% 99.9%

※ It should be noted that our product is only used for research, not for clinical use.

If you have any other questions or need other size, please get a quote.

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