Copper Lanthanum Magnesium Alloy Sputtering Target

Catalog Number

ACMA00020784

Molecular Formula

Cu-La-Mg

Appearance

Reddish metallic solid

Application

high purity Copper Lanthanum Magnesium Alloy Sputtering Targets with the highest possible density High Purity (99.99%) Copper Lanthanum Magnesium Alloy Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Specification

99.999% 99.99% 99.9% 99%

※ It should be noted that our product is only used for research, not for clinical use.

If you have any other questions or need other size, please get a quote.

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