Gadolinium(III) Nitride GdN Sputtering Target
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high purity Gadolinium(III) Nitride GdN Sputtering Targets with the highest possible density High Purity (99.99%) Gadolinium(III) Nitride GdN Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.