Holmium Barium Copper Oxide Sputtering Target

Catalog Number

ACM109489921

CAS

109489-92-1

Structure

Molecular Weight

742g/mol

Molecular Formula

HoBa2Cu3O7

Appearance

Ceramic Target

Application

high purity Holmium Barium Copper Oxide (Holmium Barium Cuprate, HBCO) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Specification

99.95% 99.9% 99.5% 99%

※ It should be noted that our product is only used for research, not for clinical use.

If you have any other questions or need other size, please get a quote.

CAS
Size
Purity
Price
Availability
Order

109489-92-1
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