Holmium Copper Sputtering Target
Catalog Number
ACM12018938-1
Description
hHigh purity Holmium Copper Sputtering Targets with the hHighest possible density HHigh Purity (99.99%) Holmium Copper Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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