Holmium Fluoride Sputtering Target

Catalog Number

ACM13760786-2

CAS

13760-78-6

Description

hHigh purity Holmium Fluoride Sputtering Targets with the hHighest possible density HHigh Purity (99.99%) Holmium Fluoride Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Structure

Molecular Weight

222g/mol

Molecular Formula

HoF3

Boiling Point

>2200°C(>3992°F)

Melting Point

1143°C(2089°F)

Density

7.64g/mL

Appearance

White target

Specification

99.999% 99.99% 99.9% 99%

※ It should be noted that our product is only used for research, not for clinical use.