Holmium Oxide Rotatable Sputtering Target

Catalog Number

ACM12055628-4

CAS

12055-62-8

Description

hHigh purity Holmium Oxide Rotatable Sputtering Targets with the hHighest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications.

Structure

Molecular Weight

378g/mol

Molecular Formula

Ho2O3

Boiling Point

3900°C(7052°F)

Melting Point

2415°C(4379°F)

Density

3.79g/mL

Appearance

Light yellow

Specification

99.999% 99.99% 99.9% 99%

※ It should be noted that our product is only used for research, not for clinical use.