Holmium Oxide Sputtering Target

Catalog Number

ACM12055628-5

CAS

12055-62-8

Description

hHigh purity Homium Oxide Sputtering Targets with the hHighest possible density HHigh Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Structure

Molecular Weight

378g/mol

Molecular Formula

Ho2O3

Boiling Point

3900°C(7052°F)

Melting Point

2415°C(4379°F)

Density

3.79g/mL

Appearance

Light yellow

Specification

99.999% 99.99% 99.9% 99%

※ It should be noted that our product is only used for research, not for clinical use.