Holmium Rotatable Sputtering Target

Catalog Number

ACM7440600-8

CAS

7440-60-0

Description

hHigh purity Holmium Rotatable Sputtering Targets with the hHighest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications.

Structure

Molecular Weight

165g/mol

Molecular Formula

Ho

Boiling Point

2695°C

Melting Point

1474°C

Density

8.795g/mL

Appearance

Silvery

Specification

99.999% 99.99% 99.9% 99%

※ It should be noted that our product is only used for research, not for clinical use.