Lanthanum Copper Manganate Sputtering Target
Catalog Number
ACMA00020787
Molecular Formula
La2CuMnO6
Application
high purity Lanthanum Copper Manganate (La2CuMnO6) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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