Lanthanum Manganate Sputtering Target
Catalog Number
ACM12031128
Application
high purity Lanthanum Manganate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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