Lanthanum Nickel Oxide Sputtering Target
Catalog Number
ACM12031184-2
Application
high purity Lanthanum Nickel Oxide Sputtering Targets with the highest possible density High Purity (99.99%) Lanthanum Nickel Oxide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications
Specification
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
- CAS
- Size
- Purity
- Price
- Availability
- Order
