Samarium Cobalt Sputtering Target
Catalog Number
ACM12305849-2
Application
high purity Samarium Cobalt Sputtering Targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99% 99.95% 99.5%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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