Samarium Oxide Rotatable Sputtering Target
Catalog Number
ACM12060581-7
Boiling Point
2,335°C(4,235°F)
Melting Point
4,118°C(7,444°F)
Application
high purity Samarium Oxide rotatable sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Oxide compounds are not conductive to electricity.
Specification
99.999% 99.99% 99.9% 99% 99.95% 99.5%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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