Scandium Nickel Sputtering Target

Catalog Number

ACMA00020762

Molecular Formula

Sc-Ni

Appearance

Metallic target

Application

high purity Scandium Nickel Sputtering targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Specification

99.999% 99.9% 99.5% 99.95% 99%

※ It should be noted that our product is only used for research, not for clinical use.

If you have any other questions or need other size, please get a quote.

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