Terbium Dysprosium Iron Sputtering Target

Catalog Number

ACMA00020707

Description

hHigh purity Terbium Dysprosium Iron Sputtering Targets with the hHighest possible density HHigh Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Molecular Formula

Tb-Dy-Fe

Appearance

Target

Application

high purity Terbium Dysprosium Iron Sputtering Targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Specification

99.999% 99.99% 99.9% 99% 99.5%

※ It should be noted that our product is only used for research, not for clinical use.