Terbium Ferrite Sputtering Target
Catalog Number
ACMA00020778
Molecular Formula
Tb3Fe5O12
Application
high purity Terbium Ferrite (Terbium Iron Oxide or Terbium Iron Garnet) Sputtering Targets with the highest possible density High Purity (99.99%) Terbium Ferrite Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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