Rare Earth Metal - Alfa Chemistry

Yttrium Aluminum Oxide Sputtering Target

Catalog Number
ACM12005219-7
CAS
12005-21-9
Structure
Molecular Weight
594g/mol
Molecular Formula
Y3Al5O12
Density
4.56g/mLat25°C(lit.)
Appearance
solid
Application
high purity Yttrium Aluminum Oxide sputtering Targets with the highest possible density High Purity (99.99%) Metallic Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9% 99%

※ It should be noted that our product is only used for research, not for clinical use.

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