Yttrium Fluoride Sputtering Target
Catalog Number
ACM13709494-3
Boiling Point
2230 °C,2503 K,4046 °F
Melting Point
1387 °C,1660 K,2529 °F
Application
high purity Yttrium Fluoride Sputtering Targets with the highest possible density High Purity (99.99%) Yttrium Fluoride Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
99.999% 99.99% 99.9%
※ It should be noted that our product is only used for research, not for clinical use.
If you have any other questions or need other size, please get a quote.
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