Yttrium Oxide Rotatable Sputtering Target

Catalog Number

ACM1314369-8

CAS

1314-36-9

Structure

Molecular Weight

226g/mol

Molecular Formula

Y2O3

Boiling Point

4300°C

Melting Point

2440°C(4420°F)

Density

5.0g/mL

Appearance

Solid

Application

high purity Yttrium Oxide Rotatable Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applications by chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications.

Specification

99.999% 99.9% 99.5% 99.95% 99%

※ It should be noted that our product is only used for research, not for clinical use.